Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片装饰在织构上
不影响分子
矢的分
,
可以用化学刻蚀
镜技术揭示其错矢图。
Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片装饰在织构上不影响分子矢的分,可以用化学刻蚀镜技术揭示其错矢图。
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