Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片装饰在织构
而不影响分子取
分布,因而可以用化学刻蚀和电镜
术揭示其错和取图。
Because the distribution of molecular director was not affected by lamellar decorating after quench, chemical etching and SEM technique were used to reveal disclination and director patterns.
由于样品淬火后晶片装饰在织构而不影响分子取分布,因而可以用化学刻蚀和电镜术揭示其错和取图。
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